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Electron‐Induced C─F Bond Activation in Sn6‐oxo Cluster Resist for Enhanced Sensitivity and Sub‐10‐nm Patterning

Journal content Created on 16 Jun 2026 Angewandte Chemie Int Ed

Wenzheng Li, Min Zhang, Yingdong Zhao, Riyao Cong, Runfeng Xu, Saihe Yang, Xiaofeng Gong, Daohan Wang, Jiangli Fan, Jun Zhao, Pengzhong Chen, Xiaojun Peng

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