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[ASAP] Mechanistic Atomic Hydrogen Chemistry for Ruthenium Deposition: From Ligand Elimination to Area-Selective Patterning

Journal content Created on 10 Jun 2026 Journal of the American Chemical Society

Kyeongmin Min, Chi Thang Nguyen, Eun-Hyoung Cho, Minhyeok Lee, Wonjoong Kim, Youngmin Sunwoo, Eunhyeok Heo, Byungjo Kim, Hao Van Bui, and Han-Bo-Ram Lee

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